Diagnostics of cutting arc plasmas
نویسندگان
چکیده
منابع مشابه
Diagnostics of etching plasmas *
Radio-frequency excited, low-pressure plasmas in halogen-containing gases are widely used to etch submicronic features in a range of materials during integrated circuit manufacture. Costly process-drift problems are often caused by the ubiquitous deposition of polymer layers on the reactor walls. Simple and robust sensors of the reactor performance are needed to monitor and manage these effects...
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We probe the electron dynamics in laser excited, gaseous plasmas by ultrashort pulses of broadband THz radiation as shown in Fig. 1. The plasma is created by an 800 nm, 0.6 mJ, 20 fs pulse from an amplified Ti:sapphire laser. Targets are samples of different gases, such as Ar, Ne, O2, H2, SF6 or Ar-SF6 mixtures, under ambient pressure which become up to 10% ionized. The probing THz pulse is obt...
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ژورنال
عنوان ژورنال: Journal of Physics: Conference Series
سال: 2014
ISSN: 1742-6596
DOI: 10.1088/1742-6596/511/1/012065